Is HSQ Negative Resist the Solution for High-Resolution E-Beam Lithography?
In the world of advanced semiconductor manufacturing and research, achieving reliable yields and crisp, defect-free patterns is a daily battle. As devices shrink to the sub-10nm scale, even minor inconsistencies in process or materials can lead to major setbacks—scrapped wafers, costly rework, and missed deadlines. For any fab or R&D team striving for competitive advantage, the choice of resist is a critical factor that can make or break success.
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